Semiconductor cleaning solutions play a critical role in maintaining the efficiency and reliability of semiconductor manufacturing processes. These solutions are specially formulated to remove contaminants, residues, and particles from semiconductor surfaces, ensuring optimal performance and product quality. The cleaning process involves various techniques such as solvent cleaning, plasma cleaning, and wet cleaning using chemicals like isopropyl alcohol, acetone, or proprietary formulations. Proper handling and disposal of these solutions are essential due to their chemical properties and environmental impact. Regular cleaning and maintenance using semiconductor cleaning solutions are vital for enhancing yield, reducing defects, and prolonging equipment lifespan in the semiconductor industry.